METHOD FOR DISTINGUISHING AN UNCERTAIN LOCATION OF A SEMICONDUCTOR WAFER IN A THERMAL PROCESS INSIDE A PROCESS CHAMBER WITH AN INFRARED RAY TRANSMISSION PROPERTY

摘要

PURPOSE: A method for distinguishing an uncertain location of a semiconductor wafer in a thermal process is provided to confirm and remove a defect by determining an actual position of the semiconductor wafer.;CONSTITUTION: A semiconductor wafer(1) is arranged on a circular pocket(3) of a rotary susceptor(2). A preset temperature is maintained with an infrared radiator and a control system and a heat radiation is measured by a pyrometer(7). The variation of the amplitude of the measured signal is determined. If a binary width exceeds the preset maximum value, it is regarded as the semiconductor wafer is incorrectly positioned. A measurement point measured by the pyrometer is partially oriented on the semiconductor wafer and the susceptor outside the semiconductor wafer. The incorrect position is set with the eccentric state in the pocket of the susceptor.;COPYRIGHT KIPO 2011