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MANUFACTURING METHOD FOR RUTHENIUM NANO-STRUCTURES BY ANODIC ALUMINUM OXIDE AND ATOMIC LAYER DEPOSITION
MANUFACTURING METHOD FOR RUTHENIUM NANO-STRUCTURES BY ANODIC ALUMINUM OXIDE AND ATOMIC LAYER DEPOSITION
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机译:阳极氧化铝和原子层沉积制备钌纳米结构的方法
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摘要
A manufacturing method of nanostructures using anodized aluminum and atomic layer deposition process is provided to form nanostructures using various materials and to obtain easily the nanostructures of the various shapes and structures. A manufacturing method of nanostructures comprises steps of: (a) injecting a substrate in an acid solution, anodizing aluminium on the substrate and forming an aluminium oxide nano template having a hole of a nano-size in the substrate; (b) filling up the hole formed in the nano template using an atomic layer deposition method; (c) removing a resistant layer formed in the nano template through an etching process; and (d) removing aluminium oxide.
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