Apparatus and method for measuring temperature of wafer in Rapid Thermal Processor

摘要

PURPOSE: An apparatus and a method for measuring temperature of a wafer in a rapid thermal processor are provided to help a user to measure a temperature of a wafer accurately by using a pyrometer. CONSTITUTION: In a device, a heating lamp(10) on the top of the wafer heat a wafer. A pyrometer(30) is the lower part of the wafer and measures the temperature of wafer. A temperature control start decision unit(70) detects a first vertex which is convex upwardly and a second vertex which is convex downwardly from a measured temperature of a pyrometer. A temperature control starting decision unit outputs a temperature control starting instruction. A temperature control unit(40) controls power supplied to a heating lamp according to temperature control starting instruction. A low-pass filter(60) removes noises of a thermograph measured at the pyrometer.