Retaining ring with a reduced wear, - and of contamination for a polishing head of a cmp - plant and polishing head and cmp - device with a retainer ring

摘要

Holding element for a polishing head, wherein the holding element an upper region (351) and a lower region (353), wherein the lower region (353) is formed from silicon carbide, and wherein, between the upper region (351) and the lower region (353) of an intermediate area (352) is provided with increased elasticity, while the intermediate region (352), an electrically conductive component or a flexible conductive element, and wherein the lower region (353) beyond the intermediate region (352) is electrically grounded, for deriving of charge carriers which, by means of friction are generated during the polishing.