NEGATIVE RESIST COMPOSITION, AND MANUFACTURING METHOD OF RELIEF PATTERN AND ELECTRONIC COMPONENT USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a negative resist composition which has excellent sensitivity and resolution and reduces a dimensional difference between a sparse pattern and a dense pattern, and a manufacturing method of relief pattern and an electronic component using the resist composition.;SOLUTION: There is provided a negative resist composition comprising: a polyphenol compound(A) which has two or more phenolic hydroxyl groups in one molecule and a molecular weight of 300-3000; an acid generating agent(B) which generates an acid directly or indirectly by irradiating with active energy rays of 248 nm or less in wavelength; and a crosslinking agent(C) which is represented by the chemical formula(1) and has one phenolic hydroxyl group and an octanol-water distribution coefficient logP of 0.7-4.0.;COPYRIGHT: (C)2012,JPO&INPIT