Negative resist composition, as well as electronic components and manufacturing method of the relief pattern using the resist composition

摘要

In the pattern formation by the irradiation of EUV, the electronic component manufacturing method and a relief pattern by using a negative resist composition capable of a high resolution and high sensitivity, to obtain a pattern of low line edge roughness, the resist composition or an electron beam I provide. Which has 2 or more in one molecule a phenolic hydroxy group, a hydroxymethyl group, and 1 or more in one molecule substituents one or more selected from the group consisting of alkoxy methyl group at the ortho position of the phenolic hydroxyl group A negative resist composition containing phenolic compound of 400-2500 molecular weight with a (A), 70 wt% content of the phenolic compound in the total solid content of the negative resist composition of the (A) is more, it is a negative resist composition.