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机译:用于光刻工艺的商业负性抗蚀剂的形态和成分表征
Institute of Physical and Theoretical Chemistry University of Tübingen Tübingen Germany;
Institute of Physical and Theoretical Chemistry University of Tübingen Tübingen Germany;
Institute of Applied Physics University of Tübingen Tübingen Germany;
Institute of Applied Physics University of Tübingen Tübingen Germany;
Institute of Applied Physics University of Tübingen Tübingen Germany;
Institute of Physical and Theoretical Chemistry University of Tübingen Tübingen Germany;
Institute of Applied Physics University of Tübingen Tübingen Germany;
Institute of Physical and Theoretical Chemistry University of Tübingen Tübingen Germany;
Negative photoresist; Hydrogen silsesquioxane; Morphology; FTIR; AFM; XPS;
机译:用于光刻工艺的商业负性抗蚀剂的形态和成分表征
机译:具有化学多功能性的超支化聚合物的合成和表征,适用于压印光刻胶
机译:了解界面附近光刻图案的偏差:底部抗反射涂层(BARC)和BARC抗蚀剂界面的表征
机译:用于下一代DRAM的负性深紫外线抗蚀剂系统的光刻评估和表征
机译:157 nm光刻胶材料的特性,用于高级光刻工艺。
机译:多金属氧酸盐杂化材料作为可图案化电介质和光刻胶的研究
机译:MERMOSE项目:商用飞机发动机微粒排放的表征:从形态到化学成分
机译:在λ= 13nm处表征saL 605负性抗蚀剂