IMMERSION LITHOGRAPHY SYSTEM AND METHOD OF IMMERSION PHOTO-LITHOGRAPHIC PATTERNING OF SEMICONDUCTOR INTEGRATED CIRCUIT

摘要

PROBLEM TO BE SOLVED: To effectively and efficiently monitor a particle in an immersion lithography process.;SOLUTION: There is provided an immersion lithography system. The system includes an imaging lens system 130, a substrate stage 120, an immersion fluid retaining module 140, a particle monitor module 160, and, in addition, a tank 168 connected to an outlet 144 to receive an immersion fluid 150, a liquid particle counter 170 connected to the tank 168 to monitor a particle in the received immersion fluid 150, and a gas inlet connected to the tank 168 to supply a gas to the tank 168. The liquid particle counter 170 detects particles in the immersion fluid 150 that flow passing through the liquid particle counter 170.;COPYRIGHT: (C)2011,JPO&INPIT