DEVICE FOR IMPROVING PLASMA DISTRIBUTION AND PERFORMANCE OF INDUCTIVELY COUPLED PLASMA

摘要

PROBLEM TO BE SOLVED: To provide an inductively coupled plasma device generating plasmas uniformly and highly densely.SOLUTION: An element 10 generates plasmas from a process gas in a process chamber by coupling the process chamber with electric energy. The element 10 is a conductive element 10 constituted of a single coil with many coil turns 32 sequentially disposed in a length direction. At least one 34a of the coil turns is oriented on a first plane 36 in almost parallel with a dielectric window of a plasma processing system and at least one 34b of the coil turns 32 is oriented on a second plane 38 which is at right angles to the first plane 36.