首页> 外国专利> SILICON CARBIDE RAW MATERIAL FOR GROWING SILICON CARBIDE SINGLE CRYSTAL AND METHOD FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL USING THE SAME

SILICON CARBIDE RAW MATERIAL FOR GROWING SILICON CARBIDE SINGLE CRYSTAL AND METHOD FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL USING THE SAME

机译:用于生长碳化硅单晶的碳化硅原材料和使用该碳化硅单晶生产碳化硅单晶的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a high purity silicon carbide single crystal, and to provide a silicon carbide raw material used in the same.;SOLUTION: The silicon carbide raw material for growing a silicon carbide single crystal is a crushed material of a silicon carbide crystal which is grown by a single sublimation recrystallization process under such conditions that the pressure of an inert atmosphere is 133 Pa to 13.3 kPa and the partition coefficient P2 of an impurity is 0.001-0.3. The method for producing a high purity silicon carbide single crystal includes growing a 4H-type silicon carbide single crystal by using the silicon carbide raw material. The silicon carbide raw material is a crushed material of one or both of a single crystal and a polycrystal. The silicon carbide raw material may be further purified by being subjected twice or more to a sublimation recrystallization process.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种生产高纯度碳化硅单晶的方法,并提供用于该方法的碳化硅原料。解决方案:将用于生长碳化硅单晶的碳化硅原料压碎。通过在惰性气氛的压力为133 Pa至13.3 kPa且杂质的分配系数P2为0.001-0.3的条件下通过单次升华重结晶过程生长的碳化硅晶体材料。用于生产高纯度碳化硅单晶的方法包括通过使用碳化硅原料来生长4H型碳化硅单晶。碳化硅原料是单晶和多晶之一或两者的压碎材料。碳化硅原料可以通过两次或更多次升华重结晶过程进一步纯化。;版权所有:(C)2011,JPO&INPIT

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号