机译:反应烧结碳化硅和单晶4H碳化硅阳极氧化抛光表面性能的比较分析
Research Center for Mechanical and Electrical Engineering, College of Field Engineering, PLA University of Science and Technology, Nanjing 210007, Jiangsu, China;
Research Center for Mechanical and Electrical Engineering, College of Field Engineering, PLA University of Science and Technology, Nanjing 210007, Jiangsu, China;
Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita 565-0871, Osaka, Japan;
Research Center for Mechanical and Electrical Engineering, College of Field Engineering, PLA University of Science and Technology, Nanjing 210007, Jiangsu, China;
Research Center for Mechanical and Electrical Engineering, College of Field Engineering, PLA University of Science and Technology, Nanjing 210007, Jiangsu, China;
Research Center for Mechanical and Electrical Engineering, College of Field Engineering, PLA University of Science and Technology, Nanjing 210007, Jiangsu, China;
Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita 565-0871, Osaka, Japan;
机译:反应烧结碳化硅陶瓷在阳极氧化辅助抛光中的氧化特性及加工性能
机译:水蒸气等离子体氧化与二氧化铈浆液抛光精制反应烧结碳化硅的机理分析
机译:反应烧结碳化硅热氧化辅助抛光最佳工艺参数的研究
机译:划刻的硅与环氧化物,醛和酰氯的反应性;通过TOF-SIMS分析划刻硅;以及用碳化钨球进行化学机械表面构图。
机译:低表面粗糙度反应烧结碳化硅等离子化学汽化加工气体成分的优化
机译:反应烧结碳化硅和单晶4H碳化硅阳极氧化抛光表面性能的比较分析
机译:碳化硅的表面科学研究:氧化,晶体生长和表面结构分析。