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The method of producing a silicon carbide single crystal using the same and single-crystal silicon carbide for growing silicon carbide raw material

机译:使用相同的单晶碳化硅生产碳化硅原料的生产碳化硅单晶的方法

摘要

PPROBLEM TO BE SOLVED: To provide a method for producing a high purity silicon carbide single crystal, and to provide a silicon carbide raw material used in the same. PSOLUTION: The silicon carbide raw material for growing a silicon carbide single crystal is a crushed material of a silicon carbide crystal which is grown by a single sublimation recrystallization process under such conditions that the pressure of an inert atmosphere is 133 Pa to 13.3 kPa and the partition coefficient P2 of an impurity is 0.001-0.3. The method for producing a high purity silicon carbide single crystal includes growing a 4H-type silicon carbide single crystal by using the silicon carbide raw material. The silicon carbide raw material is a crushed material of one or both of a single crystal and a polycrystal. The silicon carbide raw material may be further purified by being subjected twice or more to a sublimation recrystallization process. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:<要解决的问题:提供一种生产高纯度碳化硅单晶的方法,并提供用于其中的碳化硅原料。

解决方案:用于生长碳化硅单晶的碳化硅原料是在惰性气氛压力为133 Pa至13.3的条件下通过一次升华重结晶过程生长的碳化硅晶体的粉碎材料。 kPa,杂质的分配系数P2为0.001〜0.3。用于生产高纯度碳化硅单晶的方法包括通过使用碳化硅原料来生长4H型碳化硅单晶。碳化硅原料是单晶和多晶之一或两者的压碎材料。碳化硅原料可以通过经受两次或更多次升华重结晶过程而进一步纯化。

版权:(C)2011,日本特许厅&INPIT

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