首页> 外国专利> Halftone phase shift photomask, blank for halftone phase shift photomask, and method for manufacturing halftone phase shift photomask

Halftone phase shift photomask, blank for halftone phase shift photomask, and method for manufacturing halftone phase shift photomask

机译:半色调相移光掩模,用于半色调相移光掩模的坯料以及制造半色调相移光掩模的方法

摘要

A blank for halftone phase shift photomask is disclosed. The blank has a transparent substrate, a halftone phase shift layer and a light shielding film, the halftone phase shift layer and the light shielding film being layered in this order on the transparent substrate, and the 1 light shielding film is a single layered or multiple layered film which has a layer of tantalum. IMAGE
机译:公开了一种用于半色调相移光掩模的坯料。坯料具有透明基板,半色调相移层和遮光膜,该半色调相移层和遮光膜在透明基板上依次层叠,第一遮光膜为单层或多层有一层钽的层状薄膜。 <图像>

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