首页>
外国专利>
Halftone phase shift photomask, blank for halftone phase shift photomask, and method for manufacturing halftone phase shift photomask
Halftone phase shift photomask, blank for halftone phase shift photomask, and method for manufacturing halftone phase shift photomask
展开▼
机译:半色调相移光掩模,用于半色调相移光掩模的坯料以及制造半色调相移光掩模的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A blank for halftone phase shift photomask is disclosed. The blank has a transparent substrate, a halftone phase shift layer and a light shielding film, the halftone phase shift layer and the light shielding film being layered in this order on the transparent substrate, and the 1 light shielding film is a single layered or multiple layered film which has a layer of tantalum. IMAGE
展开▼