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Vacuum deposition apparatus and the target device was using it with the vacuum deposition equipment for parts
Vacuum deposition apparatus and the target device was using it with the vacuum deposition equipment for parts
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机译:真空沉积设备和目标设备正与真空沉积设备一起用于零件
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摘要
PROBLEM TO BE SOLVED: To remarkably suppress the generation of dust from a film deposition material stuck in the process of a film deposition stage and to stably and effectively prevent the peeling of a stuck film itself and a sprayed coating in a component for a vacuum film deposition system and a target device.;SOLUTION: The component 1 for a vacuum film deposition system is provided with a component body 2 and a sprayed coating 3 formed on the surface of the component body 2. The sprayed coating 3 has a surface roughness in which the average spacing S of local summits lies in the range of 50 to 150 μm, and the maximum root depth Rv and the maximum peak height Rp respectively lie in the range of 20 to 70 μm. The target device has a similar sprayed coating.;COPYRIGHT: (C)2005,JPO&NCIPI
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