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Vacuum deposition apparatus and the target device was using it with the vacuum deposition equipment for parts

机译:真空沉积设备和目标设备正与真空沉积设备一起用于零件

摘要

PROBLEM TO BE SOLVED: To remarkably suppress the generation of dust from a film deposition material stuck in the process of a film deposition stage and to stably and effectively prevent the peeling of a stuck film itself and a sprayed coating in a component for a vacuum film deposition system and a target device.;SOLUTION: The component 1 for a vacuum film deposition system is provided with a component body 2 and a sprayed coating 3 formed on the surface of the component body 2. The sprayed coating 3 has a surface roughness in which the average spacing S of local summits lies in the range of 50 to 150 μm, and the maximum root depth Rv and the maximum peak height Rp respectively lie in the range of 20 to 70 μm. The target device has a similar sprayed coating.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:显着抑制在成膜阶段的过程中附着的成膜材料产生粉尘,并且稳定有效地防止附着膜本身和真空膜用部件的喷涂层剥离。解决方案:真空膜沉积系统的组件1具备组件主体2和在组件主体2的表面上形成的喷涂层3。喷涂层3的表面粗糙度为其中局部顶点的平均间距S在50至150μm的范围内,并且最大根深度Rv和最大峰高Rp分别在20至70μm的范围内。目标设备具有类似的喷涂涂层。;版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP4686159B2

    专利类型

  • 公开/公告日2011-05-18

    原文格式PDF

  • 申请/专利权人 株式会社東芝;

    申请/专利号JP20040287003

  • 发明设计人 佐藤 道雄;中村 隆;矢部 洋一郎;

    申请日2004-09-30

  • 分类号C23C14/34;H01L21/285;

  • 国家 JP

  • 入库时间 2022-08-21 18:19:25

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