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A method of manufacturing an integrated wave nitride based devices and integrated wave nitride based devices

机译:一种基于集成氮化物的器件的制造方法和基于集成氮化物的器件

摘要

The monolithic electronic device includes, one which was formed on the input of the pair which forms the surface acoustic wave device with respect to semi- insulated piezoelectric III family nitride epitaxial layer and the epitaxial layer which were formed on the baseplate and the baseplate and output interdigital transmitter and the baseplate electronic device (HEMT, MESFET, JFET and MOSFET, photodiode and LED etc) with at least. The electronic device from the SAW device, in the opposite direction separated expedient in order to separate electrically and acoustic from the electronic device is disclosed the SAW device. With several execution forms the trench is formed with SAW device and electronic device. Furthermore, ion implantation in order to form the semi- insulated III family nitride epitaxial layer which can produce the SAW device on that is disclosed. The absorption which it adjoins to the interdigital transmitter and/or the reflected part, makes the unnecessary reflection decrease which has the possibility of disturbing the operation of the SAW device.
机译:该单片电子设备包括:相对于形成在基板和基板上的半绝缘压电III族氮化物外延层和外延层,在形成表面声波器件的一对输入端上形成的一个。至少具有交叉指型发射机和底板电子设备(HEMT,MESFET,JFET和MOSFET,光电二极管和LED等)。该SAW装置公开了一种从SAW装置的电子装置,在相反的方向上分开的有利的方式,以便从电子装置中分离出电和声。通过几种执行形式,沟槽由SAW器件和电子器件形成。此外,公开了离子注入以形成可以在其上制造SAW器件的半绝缘的III族氮化物外延层。它与叉指发射机和/或反射部分相邻的吸收使不必要的反射减少,这有可能干扰SAW装置的工作。

著录项

  • 公开/公告号JP4740836B2

    专利类型

  • 公开/公告日2011-08-03

    原文格式PDF

  • 申请/专利权人 クリー インコーポレイテッド;

    申请/专利号JP20060508961

  • 发明设计人 アダム ウィリアム ザクスラー;

    申请日2004-03-01

  • 分类号H03H9/25;H01L27/095;H03H9/145;H03H3/08;H01L41/09;H01L41/22;H01L21/338;H01L29/778;H01L29/812;H01L31/10;

  • 国家 JP

  • 入库时间 2022-08-21 18:18:50

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