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Vacuum deposition method, and for vacuum deposition sealed evaporation source equipment

机译:真空蒸镀方法及用于真空蒸镀的密封蒸发源设备

摘要

Vacuum deposition method is provided. It evaporates and distils evaporation material (22) in vacuum deposition, which heats the blowing holes (14) of container (11) and one passes through radiant heat from inner surface for evaporating vapor deposition material. In clamper (15) clamping zone evaporation vapor deposition material will not interference assessment since heatconduction is from above-mentioned heating container (11). Therefore, the steam of generation distributes the outside for entering deposition subject surface container from blowing holes (14).
机译:提供了真空沉积方法。其在真空沉积中蒸发和分散蒸发材料(22),其加热容器(11)的吹孔(14),并且一个来自内表面的辐射热用于蒸发气相沉积材料。在夹持器(15)中,夹持区的蒸发汽相沉积材料不会干扰评估,因为热传导来自上述加热容器(11)。因此,产生的蒸汽将外部分配以从吹孔14进入沉积对象表面容器。

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