首页> 外国专利> Field effect transistor incorporating at least one structure for imparting temperature-dependent strain on the channel region and associated method of forming the transistor

Field effect transistor incorporating at least one structure for imparting temperature-dependent strain on the channel region and associated method of forming the transistor

机译:结合有至少一种用于在沟道区上施加温度相关应变的结构的场效应晶体管及其形成方法

摘要

Disclosed are embodiments of a field effect transistor (FET) having decreased drive current temperature sensitivity. Specifically, any temperature-dependent carrier mobility change in the FET channel region is simultaneously counteracted by an opposite strain-dependent carrier mobility change to ensure that drive current remains approximately constant or at least within a predetermined range in response to temperature variations. This opposite strain-dependent carrier mobility change is provided by a straining structure that is configured to impart a temperature-dependent amount of a pre-selected strain type on the channel region. Also disclosed are embodiments of an associated method of forming the field effect transistor.
机译:公开了具有降低的驱动电流温度灵敏度的场效应晶体管(FET)的实施例。具体地,FET沟道区域中任何与温度有关的载流子迁移率变化同时被相反的与应变有关的载流子迁移率变化抵消,以确保驱动电流响应于温度变化而保持近似恒定或至少在预定范围内。这种相反的应变依赖性载流子迁移率变化是由应变结构提供的,该应变结构被配置为在沟道区上赋予与温度有关的量的预选应变类型。还公开了形成场效应晶体管的相关方法的实施例。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号