首页> 外国专利> Double gate depletion mode MOSFET

Double gate depletion mode MOSFET

机译:双栅极耗尽型MOSFET

摘要

A metal-oxide-semiconductor field effect transistor (MOSFET) has a body layer that follows the contour of exposed surfaces of a semiconductor substrate and contains a bottom surface of a shallow trench and adjoined sidewalls. A bottom electrode layer vertically abuts the body layer and provides an electrical bias to the body layer. A top electrode and source and drain regions are formed on the body layer. The thickness of the body layer is selected to allow full depletion of the body layer by the top electrode and a bottom electrode layer. The portion of the body layer underneath the shallow trench extends the length of a channel to enable a high voltage operation. Further, the MOSFET provides a double gate configuration and a tight control of the channel to enable a complete pinch-off of the channel and a low off-current in a compact volume.
机译:金属氧化物半导体场效应晶体管(MOSFET)具有主体层,该主体层遵循半导体衬底的暴露表面的轮廓,并包含浅沟槽的底表面和邻接的侧壁。底部电极层垂直地邻接主体层并向主体层提供电偏压。在主体层上形成顶部电极以及源极和漏极区域。选择主体层的厚度以允许顶电极和底电极层完全耗尽主体层。浅沟槽下方的主体层部分延伸了沟道的长度,以实现高压操作。此外,MOSFET提供双栅极配置和对通道的严格控制,以实现紧凑的体积中通道的完全夹断和低截止电流。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号