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A METHOD FOR DETERMINING CAPACITANCE GRADIENTS OF VERY LARGE SCALE INTEGRATED CIRCUIT (VLSI) CHIP LAYOUT

机译:确定超大规模集成电路(VLSI)芯片布局电容梯度的方法

摘要

Computing the gradients of capacitances in an integrated circuit chip layout with respect to design and process parameters is described. Included is a shape processing engine in the form of a variational mapping engine and a capacitance calculation engine that includes a gradient calculation engine. The variational mapping engine translates physical parameter variations into variations on the edges of the elementary patterns to which the layout of the integrated circuit is decomposed. The gradient calculation engine computes capacitance gradients by combining information from two sources. The first source consists of pre-existing gradients in a capacitance lookup table. The second source consists of analytical expressions of capacitance correction factors.
机译:描述了相对于设计和工艺参数计算集成电路芯片布局中的电容梯度。包括形式为变化映射引擎的形状处理引擎和包括梯度计算引擎的电容计算引擎。变化映射引擎将物理参数变化转换成集成电路布局被分解成的基本图案的边缘上的变化。梯度计算引擎通过组合来自两个来源的信息来计算电容梯度。第一个来源由电容查找表中的预先存在的梯度组成。第二个来源包括电容校正因子的解析表达式。

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