SOLAR CELL SILICON CELL ON GLASS WITH A SILICON DIOXIDE TEXTURE LAYER AND MANUFACTURING METHOD.

摘要

A method for forming a light retention structure in a thin-film silicon solar cell formed on a glass or superstratum substrate (11), the method including the steps of: a) applying a texture layer (32) to a surface of the glass substrate or superstratum (11), the texture layer (32) comprising texture particles (34/37) retained in a bonding matrix (33), the texture layer (32) being applied by preparing a glass Sol-Gel of SiO2 containing SiO2 textured particles (34/37), applying the Sol-Gel glass to the surface of the substrate or superstratum (11) so that the thickness of the glass film after being applied is less at an average diameter of the textured particles; b) heating the Sol-Gel glass until sintered, whereby after sintering the sol-gel becomes a dielectric layer of SiO2; c) forming a thin conformable barrier layer (38), in which the barrier layer material is silicon nitride with a thickness of 70 nm ± 20%. d) forming a silicon film (15) on the barrier layer on the textured surface, in which the silicon film (15) is less than 10μm thick; and e) form a photovoltaic device structure in the silicon film.