OXIDE SINTERED BODY SPUTTERING TARGET, METHOD FOR PRODUCING THE TARGET, GATE INSULATING FILM FORMED FROM OXIDE, AND METHOD FOR HEAT-TREATING THE GATE INSULATING FILM

摘要

Disclosed is an oxide sintered body sputtering target which is formed from an oxide of lanthanum (La) and aluminum (Al), and characterized in that the oxide has an constituent composition expressed as LaAl(1.01-2)O3. Also disclosed is a method for producing an oxide sintered body sputtering target having a constituent composition of LaAl(1.01-2)O3, which is characterized in that an La2(CO3)3 powder and an Al2O3 powder are used as starting material powders, the powders are blended and mixed at an Al/La molar ratio of 1.01-2, then the powder mixture is heated and synthesized in the atmosphere, then the resulting synthesized material is pulverized into a powder, and then the resulting synthesized material powder is hot-pressed, thereby obtaining a sintered body. The method provides a sintered body sputtering target which is formed from an oxide of lanthanum (La) and aluminum (Al), and is capable of efficiently and stably providing an oxide for a high-k gate insulating film.