首页> 外国专利> STRUCTURE FOR IMPROVING THE MIRROR FACET CLEAVING YIELD OF (Ga,Al,In,B)N LASER DIODES GROWN ON NONPOLAR OR SEMIPOLAR (Ga,Al,In,B)N SUBSTRATES

STRUCTURE FOR IMPROVING THE MIRROR FACET CLEAVING YIELD OF (Ga,Al,In,B)N LASER DIODES GROWN ON NONPOLAR OR SEMIPOLAR (Ga,Al,In,B)N SUBSTRATES

机译:用于改善在非极性或半球形(Ga,Al,In,B)N衬底上生长的(Ga,Al,In,B)N激光二极管的镜面开裂屈服的结构

摘要

A structure for improving the mirror facet cleaving yield of (Ga,Al,In,B)N laser diodes grown on nonpolar or semipolar (Ga,Al,In,B)N substrates. The structure comprises a nonpolar or semipolar (Ga,Al,In,B)N laser diode including a waveguide core that provides sufficient optical confinement for the device's operation in the absence of p-type doped aluminum-containing waveguide cladding layers, and one of more n-type doped aluminum- containing layers that can be used to assist with facet cleaving along a particular crystallographic plane.
机译:一种用于提高在非极性或半极性(Ga,Al,In,B)N衬底上生长的(Ga,Al,In,B)N激光二极管的镜面切割产率的结构。该结构包括一个非极性或半极性(Ga,Al,In,B)N激光二极管,包括一个波导芯,该波导芯在没有p型掺杂的含铝波导覆层的情况下为设备的操作提供了足够的光学限制,其中之一更多的n型掺杂的含铝层可用于辅助沿特定晶体平面的小面切割。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号