COMPLEX TYPE PLASMA REACTOR, CAPABLE OF GENERATING CAPACITIVELY COUPLED PLASMA AND INDUCED COUPLED PLASMA IN A MIXED STATE

摘要

PURPOSE: A complex type plasma reactor is provided to uniformly generate dense plasma by uniformly controlling the capacitive coupling of capacitive coupling electrodes.;CONSTITUTION: A plasma reactor(10) includes a reactor body(11) and a substrate supporting stand(12). A capacitively coupled electrode assembly(30) induces plasma discharge in a plasma reactor. A gas supplying part(20) supplies a gas from gas supplying source to the inside of the plasma reactor. Main power supplying source(51) supplies power to the capacitively coupled electrode assembly. Sub power supplying source supplies power to an edge plasma generating part.;COPYRIGHT KIPO 2011