MIXED TYPE PLASMA REACTOR, CAPABLE OF GENERATING A MIXTURE OF CAPACITIVELY COUPLED PLASMA AND INDUCED COUPLED PLASMA

摘要

PURPOSE: A mixed type plasma reactor is provided to variously and uniformly control the density of plasma by varying a discharging area using an antenna electrode assembly.;CONSTITUTION: A support stand(12) is arranged in a plasma reactor(10). A substrate(13) is located on the support stand. An antenna electrode assembly(30) is formed on the upper side of the plasma reactor. A gas supplying unit(20) supplies gas from a gas source to the inside of the plasma reactor through the gas spraying holes(32) of the antenna electrode assembly. A main power supply source includes a first main power supply source(40) and a second main power supply source(41). Direct current power supply sources(42, 43) are located between the main power supply source and impedance matching units(44, 45).;COPYRIGHT KIPO 2011