CHEMICALLY AMPLIFIED POSITIVE TYPE PHOTORESIST MATERIAL USED IN LIGHT EXPOSURE PROCESS BY BEAM IRRADIATION

摘要

PURPOSE: A photoresist material is provided to prevent solubility problem to tablet solvent and resist solvent and to form stable pattern.;CONSTITUTION: A chemically amplified positive type photoresist material has a repeat unit of chemical formula(1)-(3) or (1)-(4). A method for forming the resist pattern comprises: a step of forming a resist layer on a substrate to be processed using photoresist materials; a step of performing pattern irradiation of high energy; and a step of developing with alkaline developer.;COPYRIGHT KIPO 2011