PHOTO DIODE STRUCTURE AND A PHOTO DIODE MANUFACTURING METHOD, CAPABLE OF FORMING THE DEPLETION REGION UNIFORMLY REGARDLESS OF THE OUTSIDE CONDITION

摘要

PURPOSE: A photo diode structure and a photo diode manufacturing method are provided to improve the photo current in the visible light area relatively by blocking the photo current in the ultraviolet area.;CONSTITUTION: A first impurity layer(200) is formed on the surface of a substrate(100). The first impurity layer is opposite type to that of the substrate. A second impurity layer(300) is formed on the lower part of the first impurity layer. The second impurity layer is of the same type as that of the substrate.;COPYRIGHT KIPO 2011