首页> 外国专利> METHOD FOR FORMING FINE CIRCUIT STRUCTURE USING CONTROLLING RESIDUAL STRESS AND METHOD FOR FORMING PRINTED CIRCUIT BOARD USING THEREOF

METHOD FOR FORMING FINE CIRCUIT STRUCTURE USING CONTROLLING RESIDUAL STRESS AND METHOD FOR FORMING PRINTED CIRCUIT BOARD USING THEREOF

机译:利用控制残余应力形成精细电路结构的方法和利用其形成印刷电路板的方法

摘要

PURPOSE: A method for forming a micro circuit pattern through a residual stress control and a printed circuit board using the same are provided to improve yield and obtain high density by implementing a high etching factor. CONSTITUTION: A first copper foil layer is formed on the upper side of an insulation substrate. The residual stress of a copper layer is offset by applying a tensile force to a copper foil layer before the copper foil layer is etched(S300). A circuit pattern is formed by etching the first copper foil layer and a via hole is formed on the insulation layer by a drill process(S220). A second copper foil layer is formed on the surface of the first copper layer and the inner surface of the via hole by a plating process(S230). The residual stress of the second copper foil layer is offset by applying the tensile force to the second copper foil layer. A micro circuit pattern is formed by etching the first and second copper foil layers.
机译:目的:提供一种通过残余应力控制形成微电路图案的方法和使用该方法的印刷电路板,以通过实现高蚀刻因子来提高产量并获得高密度。组成:第一铜箔层形成在绝缘基板的上侧。通过在铜箔层被蚀刻之前对铜箔层施加张力来抵消铜层的残余应力(S300)。通过蚀刻第一铜箔层形成电路图案,并通过钻孔工艺在绝缘层上形成通孔(S220)。通过镀覆工艺在第一铜层的表面和通孔的内表面上形成第二铜箔层(S230)。通过对第二铜箔层施加张力来抵消第二铜箔层的残余应力。通过蚀刻第一和第二铜箔层来形成微电路图案。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号