MASK FOR MANUFACTURING THE CONTACT HOLE OF A SEMICONDUCTOR DEVICE AND A METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE USING THE SAME CAPABLE OF PREVENTING THE GENERATION OF A BRIDGE PHENOMENON BETWEEN CONTACT HOLES

摘要

PURPOSE: A mask for manufacturing the contact hole of a semiconductor device and a method for manufacturing the semiconductor device using the same are provided to improve the yield of manufacturing processes by preventing the denting phenomenon of the contact hole.;CONSTITUTION: A mask(100) for manufacturing the contact hole of a semiconductor device includes a main pattern(110) and a sub-pattern(120). The main pattern includes adjacent holes. The sub-pattern is formed at each hole of the main pattern and reduces exposure intensity between adjacent holes in an exposing operation. A photo lithography operation and an etching operation are implemented using the mask in order to form contact holes on the semiconductor device.;COPYRIGHT KIPO 2011