LITHOGRAPHIC PELLICLES USED FOR THE PREVENTION OF DUST OF A LITHOGRAPHIC MASK USED IN THE MANUFACTURE OF SI AND ULTRA LSI

摘要

PURPOSE: Lithographic pellicles are provided to ensure little haze and little decomposition gas even if an ArF excimer laser light is irradiated to an adhesive layer of an inner wall. ;CONSTITUTION: Lithographic pellicles comprise a pellicle layer(1), a pellicle frame(3) and a pressure-sensitive adhesive layer(4). The pellicle film is installed to the upper part of the pellicle frame. The adhesive layer is formed at the lower end of the pellicle frame in order to enable the adhesion of the pellicle frame to a substrate. An inner wall adhesive layer(8) consisting of a hardened material of a hardening composition containing a perfluoro compound having a perfluoro structure to a main chain.;COPYRIGHT KIPO 2011