ETCHING METHOD, A METHOD FOR MANUFACTURING A FINE STRUCTURE, AND AN ETCHING DEVICE FOR REMOVING A METAL LAYER USED IN A DIFFUSION PROCESS

摘要

PURPOSE: An etching method, a method for manufacturing a fine structure, and an etching device are provided to stripe a resist attached to a silicon wafer by using oxide materials generated through the electrolysis of aqueous solutions of sulfuric acid. ;CONSTITUTION: A sulfuric acid electrolysis unit(10) generates etching solutions with oxide materials and includes an anode(32), a cathode(42), a diaphragm(20), and a cathode chamber(40). An etching unit(12) etches a substrate(W) by using solutions with oxide materials generated from the sulfuric acid electrolysis unit. An etchant supply unit(14) supplies the etchant to the etching unit. A nozzle(61) includes an outlet for spraying the etchant to the substrate.;COPYRIGHT KIPO 2011