Fabrication of inverse micro/nano pyramid structures using soft UV-NIL and wet chemical methods for residual layer removal and Si-etching

摘要

In this study we present a novel and simple fabrication method for micro- and nano-scale inverse pyramidal structures by a combination of soft UV-NIL and wet chemical etchings. The unique feature of our method is the absence of a RIE process, which is usually applied for removal of residual layer. This is achieved by modifying the imprint resist with an O_2-plasma in asher and subsequent wet etching of residual layer by diluted HF. Combined with conventional anisotropic wet etching step with KOH/IPA, our method allows cost effective fabrication of inverse pyramidal structures on Si-substrate in batch process. Such structures in nano- and micro scale are particularly suitable for light management in photovoltaic, solid state lighting and silicon based photonic.