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METHOD FOR ELIMINATING IMPURITIES IN A TETRACHLORIDE-BASED TRICHLOROSILANE PREPARING PROCESS CAPABLE OF ELIMINATING THE IMPURITIES BY REACTING THE IMPURITIES WITH SODIUM CHLORIDE
METHOD FOR ELIMINATING IMPURITIES IN A TETRACHLORIDE-BASED TRICHLOROSILANE PREPARING PROCESS CAPABLE OF ELIMINATING THE IMPURITIES BY REACTING THE IMPURITIES WITH SODIUM CHLORIDE
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机译:消除四氯化萘基三氟硅氧烷中杂质的方法,该方法制备了可通过用氯化钠反应去除杂质的方法
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摘要
PURPOSE: A method for eliminating impurities in a tetrachloride-based trichlorosilane preparing process is provided to prevent the clogging phenomenon of processing units due to the impurities by reacting the impurities to be a liquefied compound.;CONSTITUTION: Impurities are reacted with sodium chloride(6) in a reactor under a pre-set temperature, a liquefied compound is formed. The liquefied compound is eliminated using an eliminating nozzle(7) under a pre-set temperature. The impurities are aluminum compounds or trichloroaluminum impurities. The liquefied compound is a tetrachloride aluminum compound. The pre-set temperature of the reactor is between 150 and 350 degrees Celsius. The pre-set temperature of the eliminating nozzle is between 150 and 400 degrees Celsius.;COPYRIGHT KIPO 2012
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