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METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE WITH SIDEWALL JUNCTION CAPABLE OF PREVENTING A FLOATING BODY DUE TO THE EXCESSIVE DIFFUSION OF SIDEWALL JUNCTION
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE WITH SIDEWALL JUNCTION CAPABLE OF PREVENTING A FLOATING BODY DUE TO THE EXCESSIVE DIFFUSION OF SIDEWALL JUNCTION
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机译:制造具有能够防止由于侧壁接合的过度扩散而引起的浮动体的侧壁接合的半导体装置的方法
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摘要
PURPOSE: A method for manufacturing a semiconductor device with sidewall junction is provided to reduce development costs by simplifying manufacturing processes by forming sidewall contact and sidewall junction during etching a trench which is processed two times.;CONSTITUTION: A substrate(21B) is etched and a plurality of bodies, which is separated with a first trench(24), is formed. Junction is formed in the substrate on the bottom side of the first trench. A part of the junction is etched and sidewall junction(29A), whose side is exposed by a second trench, is formed. A metal bit line(33), which fills the second trench while being connected to the sidewall junction, is formed.;COPYRIGHT KIPO 2012
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