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Change of form or allotrope of silicon induced by electromagnetic radiation for resistance tuning of an integrated circuit
Change of form or allotrope of silicon induced by electromagnetic radiation for resistance tuning of an integrated circuit
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机译:电磁辐射引起的硅形态或同素异形体变化,用于集成电路的电阻调谐
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摘要
The electronic device includes a dielectric layer of the substrate and on the semiconductor substrate. Resistance link disposed on the substrate includes a resistive region and a second resistive region first. Resistance of the first region has the form of a first resistor and a first. Resistance of the second region has a form different second resistor and the second.
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