The photoresist polymer, the photoresist constituent, production manner and semiconductor device null below-mentioned expression of the semiconductor device which

摘要

A photoresist polymer comprising a fluorine component, a photoresist composition containing the photoresist polymer and an organic solvent to reduce surface tension, and a method for manufacturing a semiconductor device using the same by forming a photoresist film uniformly on the whole surface of an underlying layer pattern to allow a subsequent ion-implanting process to be performed stably.