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The composition formula in production mannered null atomic comparing of the FeCo based alloy sputtering target

机译:FeCo基合金溅射靶生产方式零原子比较的组成公式

摘要

PROBLEM TO BE SOLVED: To provide an Fe-Co alloy sputtering target material by which machinability of an Fe-Co alloy sputtering target material for deposition of soft magnetic films used for a perpendicular magnetic recording medium can be improved and sputtering of the soft magnetic films can be stably done.;SOLUTION: The Fe-Co alloy sputtering target material is a sintered target material in which one or two elements M1 selected between Nb and Ta, in a content not lower than that of eutectic composition with Fe, are contained in an Fe-Co alloy having a composition formula in atomic ratio represented by FeX-Co100-X (where 20≤X≤70 is satisfied) and has ≤37 HS Shore hardness.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种Fe-Co合金溅射靶材料,通过该Fe-Co合金溅射靶材料,可以改善用于沉积用于垂直磁记录介质的软磁性膜的Fe-Co合金溅射靶材料的机械加工性,并且可以对软磁性膜进行溅射解决方案:Fe-Co合金溅射靶材料是一种烧结靶材料,其中包含的Nb和Ta之间的一种或两种元素M1的含量不低于与Fe的共晶成分的含量。一种Fe-Co合金,具有以Fe X -Co 100-X 表示的原子比的组成式(其中满足20&x; X≤ 70)并且具有≤ 37 HS肖氏硬度;;版权:(C)2009,JPO&INPIT

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