首页> 外国专利> Substrate handling of the proximity exposure device and the proximity exposure device, and the chuck containment the production mannered null substrate

Substrate handling of the proximity exposure device and the proximity exposure device, and the chuck containment the production mannered null substrate

机译:接近式曝光设备和接近式曝光设备的基板处理,以及卡盘容纳区,生产出的原始基板

摘要

PROBLEM TO BE SOLVED: To speedily move a large-sized substrate with high precision by using linear motors to reduce loads applied on a guide and fitting portions of needles when moving the substrate on a stage base divided into a plurality of bases.;SOLUTION: Plate-like stators 31 incorporated with magnets of even numbers of linear motors are fitted while being stood on a stage base 11 divided into the plurality of bases, and plate-like needles 32 incorporated with coils of even numbers of the linear motors are fitted to an X stage 14 to face the stators of the linear motors. Each roller holder 35 energizes each roller 36 toward each stator fitting base 33. The each roller 36 is energized to the each stator fitting base 33 to suppress a variation in a gap between the stator 31 and needle 32 of each linear motor while allowing the needle 32 of the each linear motor to move up and down.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:当在分成多个基座的工作台基座上移动基板时,通过使用线性电动机来减少施加在导板和针的安装部分上的负载,可以通过使用线性电动机来快速快速地移动大型基板。装配有偶数个线性电动机的磁体的板状定子31竖立在被分成多个基座的台座11上,装配有偶数个线性电动机的线圈的板状针32。 X台14面对直线电动机的定子。每个辊保持器35朝着每个定子配件基座33激励每个辊36。每个辊36被激励到每个定子配件基座33,以抑制每个线性电动机的定子31和针32之间的间隙的变化,同时允许针每个线性马达可上下移动32个。版权所有:(C)2010,日本特许厅&INPIT

著录项

  • 公开/公告号JP5047040B2

    专利类型

  • 公开/公告日2012-10-10

    原文格式PDF

  • 申请/专利权人 株式会社日立ハイテクノロジーズ;

    申请/专利号JP20080104309

  • 发明设计人 松山 勝章;

    申请日2008-04-14

  • 分类号G03F7/20;G03F7/22;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 17:37:14

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