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Substrate handling of the proximity exposure device and the proximity exposure device, and the chuck containment the production mannered null substrate
Substrate handling of the proximity exposure device and the proximity exposure device, and the chuck containment the production mannered null substrate
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机译:接近式曝光设备和接近式曝光设备的基板处理,以及卡盘容纳区,生产出的原始基板
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摘要
PROBLEM TO BE SOLVED: To speedily move a large-sized substrate with high precision by using linear motors to reduce loads applied on a guide and fitting portions of needles when moving the substrate on a stage base divided into a plurality of bases.;SOLUTION: Plate-like stators 31 incorporated with magnets of even numbers of linear motors are fitted while being stood on a stage base 11 divided into the plurality of bases, and plate-like needles 32 incorporated with coils of even numbers of the linear motors are fitted to an X stage 14 to face the stators of the linear motors. Each roller holder 35 energizes each roller 36 toward each stator fitting base 33. The each roller 36 is energized to the each stator fitting base 33 to suppress a variation in a gap between the stator 31 and needle 32 of each linear motor while allowing the needle 32 of the each linear motor to move up and down.;COPYRIGHT: (C)2010,JPO&INPIT
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