Monoclinic type vanadium dioxide thin film manufacturing equipment, monoclinic type vanadium dioxide thin film manufacturing method, the switching element manufacturing method, and the switching element

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for producing a thin film of vanadium dioxide, which is suitable for mass-producing a semiconductor element (switching element) having the thin film of vanadium dioxide formed thereon.;SOLUTION: The apparatus 1 for producing the thin film of vanadium dioxide by depositing the thin film of vanadium dioxide on a substrate 2 with a sputtering technique comprises: a vacuum vessel 3; a heating means 4 which is arranged in the vacuum vessel 3, and heats a placed substrate 2 at 300 to 450°C; a holder part 5 which is arranged so as to oppose to the heating means 4, mounts a target material containing vanadium thereon and is provided with a magnet 52; a gas introduction tube 6 for introducing an inert gas and oxygen gas into the vacuum vessel 3; an electric power supply 7 which is connected to the holder part 5 in order to apply high-frequency voltage to the target material 51; and an electroconductive metallic member 8 which is arranged between the heating means 4 and the target material 51, and is connected to an electric power supply 81 for applying high-frequency voltage to the metallic member 8.;COPYRIGHT: (C)2007,JPO&INPIT