首页> 外国专利> SEMICONDUCTOR DEVICES HAVING A CONTROL GATE ELECTRODE INCLUDING A METAL LAYER FILLING A GAP BETWEEN ADJACENT FLOATING GATES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICES HAVING A CONTROL GATE ELECTRODE INCLUDING A METAL LAYER FILLING A GAP BETWEEN ADJACENT FLOATING GATES AND METHODS OF FABRICATING THE SAME

机译:具有控制门电极的半导体器件,其中包括金属层填充相邻浮动门之间的间隙及其制造方法

摘要

A semiconductor device includes a device isolation layer defining a plurality of active regions of a semiconductor substrate, floating gates and a control gate electrode in which the lowermost part of the electrode is constituted by a metal layer. The control gate electrode crosses over the active regions. The floating gates are disposed between the control gate electrode and the active regions. The tops of the floating gates are disposed at a level above the level of the top of the device isolation layer such that a gap is defined between adjacent ones of the floating gates. A region of the gap is filled with the metal layer of the control gate electrode.
机译:半导体器件包括限定半导体衬底的多个有源区域的器件隔离层,浮栅和控制栅电极,其中电极的最下部由金属层构成。控制栅电极跨过有源区。浮栅设置在控制栅电极和有源区之间。浮栅的顶部设置在器件隔离层的顶部的水平之上的水平处,使得在相邻的浮栅之间限定间隙。间隙的区域填充有控制栅电极的金属层。

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