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Methods of forming a metal silicate layer and methods of fabricating a semiconductor device including the metal silicate layer
Methods of forming a metal silicate layer and methods of fabricating a semiconductor device including the metal silicate layer
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机译:形成金属硅酸盐层的方法和制造包括该金属硅酸盐层的半导体器件的方法
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摘要
Methods of forming a metal silicate layer and methods of fabricating a semiconductor device including the metal silicate layer are provided, the methods of forming the metal silicate layer include forming the metal silicate using a plurality of silicon precursors. The silicon precursors are homoleptic silicon precursors in which ligands bound to silicon have the same molecular structure.
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