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ALL-REFLECTIVE OPTICAL SYSTEMS FOR BROADBAND WAFER INSPECTION

机译:宽带宽带晶圆检查的全反射光学系统

摘要

All-reflective optical systems for broadband wafer inspection are provided. One system configured to inspect a wafer includes an optical subsystem. All light-directing components of the optical subsystem are reflective optical components except for one or more refractive optical components, which are located only in substantially collimated space. The refractive optical component(s) may include, for example, a refractive beamsplitter element that can be used to separate illumination and collection pupils. The optical subsystem may also include one or more reflective optical components located in substantially collimated space. The optical subsystem is configured for inspection of the wafer across a waveband of greater than 20 nm. In some embodiments, the optical subsystem is configured for inspection of the wafer at wavelengths less than and greater than 200 nm.
机译:提供了用于宽带晶圆检查的全反射光学系统。被配置为检查晶片的一种系统包括光学子系统。光学子系统的所有导光组件是反射光学组件,除了一个或多个折射光学组件外,它们仅位于基本准直的空间中。折射光学组件可包括例如折射分束器元件,其可用于分离照明和收集光瞳。光学子系统还可包括位于基本准直的空间中的一个或多个反射光学组件。光学子系统被配置用于在大于20 nm的整个波段上检查晶片。在一些实施例中,光学子系统被配置用于以小于和大于200nm的波长检查晶片。

著录项

  • 公开/公告号IL186168B

    专利类型

  • 公开/公告日2012-02-29

    原文格式PDF

  • 申请/专利权人 KLA-TENCOR TECHNOLOGIES CORPORATION;

    申请/专利号IL186168

  • 发明设计人

    申请日2007-09-23

  • 分类号G01Nnull/null;

  • 国家 IL

  • 入库时间 2022-08-21 17:24:46

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