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HIGH-SENSITIVE MEASURING METHOD, A DEVICE FOR THE SAME, A SELF-ASSEMBLY MONOLAYER USED FOR THE SAME IN A PROCESS FORMING THE SELF-ASSEMBLY MONOLAYER ON A GOLDEN THIN FILM USING AN INFRARED RAYS SPECTRAL DEVICE, CAPABLE OF REDUCING A MANUFACTURING TIME DUE TO A GROWTH OF A SELF-ASSEMBLY MONOLAYER
HIGH-SENSITIVE MEASURING METHOD, A DEVICE FOR THE SAME, A SELF-ASSEMBLY MONOLAYER USED FOR THE SAME IN A PROCESS FORMING THE SELF-ASSEMBLY MONOLAYER ON A GOLDEN THIN FILM USING AN INFRARED RAYS SPECTRAL DEVICE, CAPABLE OF REDUCING A MANUFACTURING TIME DUE TO A GROWTH OF A SELF-ASSEMBLY MONOLAYER
PURPOSE: A high-sensitive measuring method, a device for the same, a self-assembly monolayer used for the same in a process forming the self-assembly monolayer on a golden thin film using an infrared rays spectral device are provided to easily grow a self-assembly monolayer by forming a golden thin film less than 2 nano meter in both sides of a silicon.;CONSTITUTION: A high-sensitive measuring method in a process forming the self-assembly monolayer on a golden thin film using an infrared rays spectral device is as follows. A silicon substrate in which golden thin film is formed in both surfaces is immersed in solution where organic molecules is melted so that a self-assembly monolayer is formed. The substrate where a monolayer is formed is taken out and installed in chamber where an infrared rays spectral device. Infrared ray is incident to one side end part of the silicon substrate where the monolayer is formed so that lights are successively reflected to both sides of the golden thin film. Lights projected by being reflected are incident to a detecting device by converting a progressive direction so that a light detection is performed.;COPYRIGHT KIPO 2012
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