METHOD FOR REPAIRING THE REAR SIDE OF A PHOTO-MASK CAPABLE OF POLISHING THE ENTIRE REAR SIDE OF THE PHOTO-MASK BY FORMING A PROTECTIVE FILM ON THE FRONT SIDE OF THE PHOTO-MASK

摘要

PURPOSE: A method for repairing the rear side of a photo-mask is provided to improve the efficiency of a repairing process and to eliminate inefficiency of a repairing process due to partial polishing by using existing equipment.;CONSTITUTION: Optical patterns are formed on the front side of a photo-mask(110). A defect region on the rear side of the photo-mask is inspected. A pattern protective layer(120) is formed on the entire front side of the photo-mask. The rear side of the photo-mask, which includes a scratch region, is completely polished. During the formation of the pattern protective layer, a photo-sensitive material layer is coated and cured to form the pattern protective layer. During the polishing operation, a chemical mechanical polishing operation is implemented.;COPYRIGHT KIPO 2012