Improvement in instable analysis of heat inflation induced line-width after replacing pellicle with diamond film on reticle (photo-masks)

摘要

A new reticle is designed that takes advantage of the high value of thermal conductivity of diamond to add a layer of diamond film to the bottom of traditional pellicle-reticle; that is, the new reticle replaces the pellicle with a diamond material. This method may help maintain the future manufacturing process of photo-lithography below 35 nm and can improve the problem of slightly out of shape reticle caused by the long-term effects of light and thermal energy.