METHOD FOR REPAIRING THE DEFECT OF A PHOTO-MASK, CAPABLE OF IMPROVING THE REPAIRING PROCESS OF A PATTERN AFTER AN ETCHING PROCESS BY REMOVING THE DEFECT OF A RESIST FILM PATTERN

摘要

PURPOSE: A method for repairing the defect of a photo-mask is provided to prevent the transference of the defects on a pattern after an etching process by detecting the defects of a resist film pattern.;CONSTITUTION: A mask film is formed on a substrate(100). A resist film is formed on the mask film. A resist film pattern(180) is formed on the resist film. The defect of the resist film pattern is detected by the reflection light. The defect of the resist film pattern is repaired through a repairing process. A mask film pattern is formed using the repaired resist film pattern as an etching mask.;COPYRIGHT KIPO 2010