Method of fabricating and repairing a short defect in LCD device having a residue pattern of a predetermined line width removed after forming photo-resist pattern through rear exposure

摘要

A method for repairing a short defect according to the present invention includes forming a first conductive pattern on a substrate, forming a photo-resist pattern on the first conductive pattern using a rear exposure for the first conductive pattern being shorted by a residue pattern, and removing the residue pattern exposed through the photo-resist pattern.