RESIST FILM, RESIST COATED MASK BLANKS INCLUDING THE SAME, A METHOD FOR FORMING RESIST PATTERNS USING THE SAME, AND A CHEMICALLY AMPLIFIED RESIST COMPOSITION CAPABLE OF IMPROVING DRY ETCHING RESISTANCE AND LINE EDGE ROUGHNESS CHARACTERISTIC

摘要

PURPOSE: A resist film, a resist coated mask blanks including the same, a method for forming resist patterns using the same, and a chemically amplified resist composition are provided to include a polymer compound in which the hydrogen atom of the phenolic hydroxyl group is substituted with a pre-determined group.;CONSTITUTION: A resist film is formed based on a chemically amplified resist composition. The chemically amplified resist composition includes a polymer compound, a compound generating acid based on the irradiation of active rays or radiation rays, and an organic solvent. The polymer compound includes a structure in which the hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by chemical formula 1. In chemical formula 1, R1 is a hydrocarbon group; R2 is a hydrogen atom or a hydrocarbon group; Ar is an aryl group; R1 and Ar are capable of forming a cyclic with/without a hetero atom; and * is the bonding position of the phenolic hydroxyl group and an oxygen atom.;COPYRIGHT KIPO 2013