To dispose of impurities residual extrinsic in a substrate made of zno or znmgo of the n type, and for carrying out a p type doping of this substrate.

摘要

Method of purification of a substrate made of zno and / or znmgo of the n type in order to reduce or eliminate the residual impurities temperature of the substrate with a view of the p type doping of at least a portion of the substrate, in which it is introduced into at least one zone of the substrate at least one reactive species having a high chemical affinity, with at least one of the extrinsic impurities and / or being capable of creating the crystalline defects, and it is thus created in the substrate at least one so-called "getter " zone capable of trapping the impurities in the residual temperature and / or in which the residual impurities extrinsic are trapped; and an annealing of the substrate in order to diffuse the residual impurities extrinsic towards the zone" getter " and / or out of the zone "getter ", preferably to at least one surface of the substrate. Method of preparation of a substrate made of zno and / or znmgo with p type doping, comprising at least one step of purification of a substrate made of zno and / or znmgo by the method above ci -.