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Method of manufacturing the solar cells and thin-film solar cells and a passivation layer and a microcrystalline absorber layer
Method of manufacturing the solar cells and thin-film solar cells and a passivation layer and a microcrystalline absorber layer
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机译:太阳能电池和薄膜太阳能电池以及钝化层和微晶吸收体层的制造方法
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摘要
A Photovoltaic cell 60 includes a substrate 31, a front or first electrode 42 of transparent conductive oxide and at least one p-i-n junction 43 of microcrystalline silicon, said p-i-n junction 43 comprising a first n-doped silicon sub- layer 44 and a second p-doped silicon sub-layer 46 and a third sub-layer 45 with essentially intrinsic microcrystalline silicon. A passivation layer 45 comprising essentially intrinsic amorphous silicon is arranged a) between the microcrystalline intrinsic sub-layer 45 and n-doped silicon layer 46 or b) as a layer embedded in the microcrystalline intrinsic sublayer 45 or c) both. A method for manufacturing such a photovoltaic thin film silicon solar cell includes providing a transparent substrate 41 with a TCO front electrode 42 on it; depositing a p-doped Si layer 44, a microcrystalline silicon intrinsic layer 45, a passivation layer 55 from essentially intrinsic amorphous silicon, a n-doped Si layer 46 and a back electrode layer 48.
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