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Trench metal oxide semiconductor field-effects transistor transistor

机译:沟槽金属氧化物半导体场效应晶体管

摘要

The trench metal oxide semiconductor field-effects transistor transistor (TMOSFET), the multiple mesas which are laid out between the multiple gate fields are included. Each mesa includes the drift field and the computer field. As for width of the mesa, it is order of the quantum well size in the surface with the gate insulator field and the computer field. In addition as for TMOSFET, the multiple gate insulator fields which are laid out with the gate field and the computer field, the drift field and the drain field are included. Originating in the thickness of the gate insulator field with the gate field and the aforementioned drain field, getotoudorein electric field of cross direction is generated substantially in off state, because of this, the deplete of the electric charge inside the drift field is supported. Choice figure Drawing 2
机译:包括沟槽金属氧化物半导体场效应晶体管晶体管(TMOSFET),布置在多个栅极场之间的多个台面。每个台面包括漂移场和计算机场。台面的宽度是表面的量子阱大小与栅极绝缘体场和计算机场的数量级。另外,对于TMOSFET,还包括由栅极场和计算机场,漂移场和漏极场布置的多个栅极绝缘体场。由具有栅极场和上述漏极场的栅极绝缘体场的厚度开始,基本上在截止状态下产生横向的甲妥英树脂电场,因此,支持了漂移场内部的电荷的耗尽。选择图>图2

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